Hi Yilei,

  You need to determine what type of particles are causing your
contamination and where they are coming from before we can suggest an
appropriate cleaning method.

Phillipe Tabada


>From: "Yilei Zhang" 
>Reply-To: General MEMS discussion 
>To: mems-talk@memsnet.org
>Subject: [mems-talk] particles on KOH etching silicon wafer
>Date: Mon, 2 Aug 2004 10:21:18 -0500 (CDT)
>
>Hello all,
>Now i am doing KOH etching of silicon wafer. But frequently found lots of
>particls on sample surface after etching, which make it difficult to get
>good
>afm images. I usually do the standard clean before and after the etching. I
>am
>not sure whether it is caused by the contamination in KOH solution or I
>need
>to do other cleaning process. Can anybody give me suggestions? thanks.
>
>
>Regards,
>Yilei Zhang
>
>
>
>
>
>
>
>
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