hii,

  you can make the exposure time around 50 seconds and softbake for 100 degrees
for about half an hour

regards
rakesh

Amani Salim  wrote:
Dear Colleagues,

I am trying to make a very thick photoresist (using 1075 positive thick PR)
and eventually will exposed it using a clear field mask,
the thickness am looking so far is from 30-100 microns, if anyone has any
tips for me to make this process a success (exposure time, soft bake and
post bake temp and time, ect..), that'll be great, thanks

Amani Salim
******************************************
Research Assistant
Department of Electrical and Computer Eng.
U of Minnesota,T.C.
UMBM Lab
Office phone: 612 626-0590
Lab phone: 612-626-7188

_______________________________________________
MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.memsnet.org/

Yahoo! India Matrimony: Find your life partneronline.