Dear colleagues,

regarding my question below, i am trying to make pillars structure, since I
have a clear field mask, so i cant use Su8 negative resist since this will
give me holes, that it why I use 1075 instead, thanks

Amani



On 6 Aug 2004, Amani Salim wrote:
> Dear Colleagues,
>
> I am trying to make a very thick photoresist (using 1075 positive thick
PR)
> and eventually will exposed it using a clear field mask,
> the thickness am looking so far is from 30-100 microns, if anyone has any
> tips for me to make this process a success (exposure time, soft bake and
> post bake temp and time, ect..), that'll be great, thanks
>
> Amani Salim
> ******************************************
> Research Assistant
> Department of Electrical and Computer Eng.
> U of Minnesota,T.C.
> UMBM Lab
> Office phone: 612 626-0590
> Lab phone: 612-626-7188
>
>
Amani Salim
******************************************
Research Assistant
Department of Electrical and Computer Eng.
U of Minnesota,T.C.
UMBM Lab
Office phone: 612 626-0590
Lab phone: 612-626-7188