Hi,
I've seen previous posts regarding the attack of Aluminum by common
developers.  I am using a bilayer resist for lift-off which is S1813 on
LOR-5B.  I need a chemical that can strip the LOR-5B without damaging the
Aluminum.

After metal deposition (which includes Al), I do the lift-off with Acetone
which works just fine.  Now I need to strip the LOR-5B.  I can use the 319
developer to etch LOR-5B but it is TMAH-based and thus etches the Aluminum.
Typically, I have a very thick edge-bead of LOR-5B which requires several
minutes of soaking in 319 dev. to remove.  This seems to really degrade the
Aluminum layer.

What can use I use to strip LOR-5B without damaging the aluminum layer?
Will NMP attack the aluminum?
Thanks!

Bill