IF you can use a different substrate, I have found that the easiest thing to do is buy test grade photomasks with the chrome and resist already on them. We use glass from Nanofilm in Westlake Village CA. We use BOE to etch the glass. It is slow but we only need to etch 10-20 microns. We do get undercutting of the chrome, we don't even keep the resist for the glass etch. Agitation in the BOE and frequent stops for cleaning in a sulfuric acid hydrogen peroxide solution are an absolute must for us to get features we consider smooth. I would be interested in knowing if you are using a dry etch. Mark >>> pb96@cornell.edu 08/06/04 3:13 PM >>> >When I am doing glass etching, I coated chromium sacrificial layer to >increase adhesion by sputtering, first. And on this layer, coat photoresist >1818, develop PR and etch Cr. Then after glass is exposed, start to etching >glass. > > > >But, when glass is etching, the edge of sacrificial layer is defected. >Therefore, the side well of channel is very rough, not smooth. > >If someone knows the answer how to increase adhesion between glass and Cr, >and Cr and photoresist, please let me know. > >Thank you. > > > >Jinkee Lee What chemistry do you use to etch the glass. My experience is that Soda lime glass cannot be dry etched cleanly. This has to do with the chemistry of the glass. You can use Fused Silica glass which would give you clean profile. I dry etch fused silica without any metal mask. Pari. _______________________________________________ MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.memsnet.org/