durusmail: mems-talk: PGMEA application
PGMEA application
2004-08-31
2004-09-02
PGMEA application
Narges Jodeyri
2004-08-31
Hello,
I’m a student and at the moment I am working for my Diploma thesis about
photoresists. Could you tell me please something about application of PGMEA
(CAS.Nr. 106856) in lithography?
Could you tell me, the advantages and disadvantages of this product,
compared to Acetone or NMP?

I heard if you use Acetone instead PGMEA as Edge bead remover, Acetone would
not remain at the edge and would damage the desired photoresist film. Could
you tell me, in this case how much is the loss of chips? To which extent
would acetone decrease the yield of chips?

Thank you very much

With best regards


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