See the "CRC Handbook of Metal Etchants", edited by Walker and Tarn from the CRC press, pages 1247-1249. According to the book, it's very difficult to etch. One etch is 1:5 HCL:H20, using the SnO as an anode, although they claim this to be a poorly controlled etch. Many of the etches involve HBr, which is VERY dangerous stuff, and should only be used by someone familiar with it. Ion milling or other physical process may be a better bet than wet etching, if available. But check out the book, it's a great one to have in any event. David Nemeth Senior Engineer Sophia Wireless, Inc. 14225-C Sullyfield Circle Chantilly, VA Ph: (703) 961-9573 x206 Fax:(703) 961-9576 -----Original Message----- From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]On Behalf Of nadig@samtelgroup.com Sent: Thursday, August 26, 2004 11:53 PM To: mems-talk@memsnet.org Cc: mems-talk@memsnet.org Subject: [mems-talk] Tin Oxide Etching Process Hi !!!!!!! Please Suggest me the Chemicals and Wet Etching Process For Tin Oxide Coated Glass. My glass Plate size is 1200 mm x 700 mm and Sputter Coated Tin oxide Thickness is 1.6 Micron. Nadig Pranesh _______________________________________________ MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.memsnet.org/