Don't neglect the possibility that the problem is pinholes in the Cr mask,
not the BOE.  Perhaps photoresist over the chrome mask could protect the
bulk of the mask, with the Cr defining the edges.

David Nemeth
Senior Engineer
Sophia Wireless, Inc.
14225-C Sullyfield Circle
Chantilly, VA
Ph: (703) 961-9573 x206
Fax:(703) 961-9576

-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org]On Behalf Of Parijat Bhatnagar
Sent: Thursday, September 02, 2004 12:04 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] BOE selective to etch glass, not Cr


Dear group,

I etched 7 microns of glass in 6:1 BOE which had 100 nm of Cr as a mask. I
could etch the glass but had some pitting in Cr. Does anybody has any
experience with etching in 60:1 BOE, or 30:1 BOE. Will that be a better
choice? Can I etch longer in more dilute BOE to still etch 7-8 microns of
glass but saving the Cr mask.

Sincerely,
Pari.

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