Hi Ebin,

some solvents and the direct presence of water can cause copper to corrode,
or "etch".  There are a couple things you could try, you might try rinsing
in isopropyl, or you might try searching for a vendor who sells "safe for
copper" solvent for resist strip.  There's a product called AZ S-46 Stripper
from Clariant which I believe is intended for use with copper films.

-Justin

Justin C. Borski
MEMS Program Manager
Advanced MicroSensors Inc.
jborski@advancedmicrosensors.com



-----Original Message-----
From: Ebin Liao [mailto:ebliao@yahoo.com]
Sent: Friday, September 03, 2004 4:35 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] photoresist stripping with presence of Cu


Hi, Dear MEMS fellows,

I have a question about photoresist stripping with
copper. When I strip the photoresist with PR-3000 with
the presense of Cu, I found some black spots on the Cu
pattern. At first I thought it's resist residue, but
later when I increase the stripping time, there are
even more black spots and also the copper pattern
dimension is somewhat reduced. Then I guess that the
copper may be attacked by the stripper.
Anyone can explain this phenomenon, its effect and
possible solutions? Thanks a lot.

Best regards,
Ebin

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