hi guys,
 I am using the Pirahna to remove the remaining photoresist on my wafer. However
I have TaN and Ta on my wafer. Does Pirahna etch the TaN and Ta too much?
Actually I just dip my samples into the Pirahna for 40sec. Thanks. By the way,
are there any better methods to remove the remaining photoresist completely?
Regards,
Feng Zhu