Lee,

You can us HF to remove native oxide instantly from your Si but it grows
right back in seconds.  If you need to have an oxide free surface before
depositing a film you must sputter etch your sample inside the vacuum
chamber.

Brent

"Lee, Duhyun" wrote:

> Dear MEMS Talkers,
>
> I'm trying to remove the native oxide on Si (111) surface and
> to sputter a metal on the bare (111) surface.
> To my knowledge, BOE seems to be suitable but I have no experience on it.
>
> Please show me your recipe to get a fresh Si(111) surface for sputtering.
>
> Lee, Duhyun
>
> ========================================
> duhyun@skku.edu
> Technology Innovation Center(TIC)
> Dep. of Advanced Materials Eng.
> Sungkyunkwan University, KOREA
> Tel +82-31-290-5645
> Fax +82-31-290-5644
> ========================================
>
> _______________________________________________
> MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.memsnet.org/