Hi Feng Zhu,

    The Pirahna etch has the ability to etch Ta.  Another way of removing
photoresist (PR) is by using heated PR stripper, acetone dip, ethonol dip
and then water rinse.  The time spent on each solution will depend on the
thickness and characteristics of your PR.

Phillipe Tabada


>From: "Feng Zhu" 
>Reply-To: General MEMS discussion 
>To: mems-talk@memsnet.org 
>Subject: [mems-talk] the Pirahna etch
>Date: Thu, 9 Sep 2004 19:35:24 -0500
>
>hi guys,
>  I am using the Pirahna to remove the remaining photoresist on my wafer.
>However I have TaN and Ta on my wafer. Does Pirahna etch the TaN and Ta too
>much? Actually I just dip my samples into the Pirahna for 40sec. Thanks. By
>the way, are there any better methods to remove the remaining photoresist
>completely?
>Regards,
>Feng Zhu
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