Hi Laleh,

        I am not sure what kind of etching, wet or RIE, you are looking
for. But 1-2 micron feature size is rather small for wet etching. Would
RIE be better and also available for your work? W and Mo films can be
etched by CF4, CF4/O2, SF6/Ar gases or other fluorine-based gases. You can
use photoresist or Cr as masking materials.


Yours sincerely,

Isaac Chan

Ph.D. Candidate
Dept. Electrical & Computer Engineering
University of Waterloo
200 University Ave. W
Waterloo, Ontario, Canada
N2L 3G1
Tel: (519) 888-4567, ext. 6014
Fax: (519) 746-6321
iwchan@venus.uwaterloo.ca
http://www.ece.uwaterloo.ca/~a-sidic


On Thu, 9 Sep 2004 lrabieir@purdue.edu wrote:

> I need to etch W and Mo films, What are the best etchants which can be used in
> 1-2 Micron resolution?
>
> Laleh Rabieirad
>
> ECE Department
> Purdue University
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