At 05:09 PM 9/15/2004 +0200, you wrote:
>Does anybody know a way to locally remove a thin gold/titanium film? Say
>open up 0.1-1mm diameter holes in a Au/Ti (200/15nm) film on a silicon
>wafer without damaging the silicon? The placement accuracy of the holes
>need to be +/- 100µm. Regular lithography cannot be used since the film
>should remain untouched with polymers. Are there any kinds of laser
>processing or similar that can be used? Any ideas?
>
>                      Regards,
>
>                      Patrik

You could put a top layer of Ti on the gold then use photolith to pattern
the top Ti into a mask for wet-etching the gold.  Then follow up with your
Ti etch to remove the Ti mask and your exposed Ti adhesion layer.

--
Mark Fuller
Microelectronics Fabrication Facility
Washington State University
Dana Hall 102
Pullman, WA  99164-2711
(509)335-1797