Hello, I am trying to use HF to etch porous alumina layer on aluminum
substrate. Can anyone give me information on the speed of etching and
the concentration of HF I should use? Thank you.

FAN, Yong
Turbulence and Heat Transfer Laboratory. / Frontier Energy System
Laboratory.
Department of Mechanical Engineering, The University of Tokyo.
Email: fan@thtlab.t.u-tokyo.ac.jp