Than you very much, Roger.
I was thinking to use HF to do my etching (even cause I don't have equipment for
plasma etching in the lab I am working now in)
So, can you give me an HF percentage/etchrate table to perform this etch (rate <
1um/min)(or a reference to consult)
I don't have many samples to try cause we buy them from external company, so I
want to reduce the losses with tries.
Thanks again for the help

Alberto N.





Shile :

> You can etch soda-lime glass with HF or BOE.  The etch rate will be well
> under 1 um/min.  Photoresist will tend to lift if used as a mask. I have
> used Cr a mask for etching Pyrex with BOE.  However this resulted in
> undercut greater than the etch depth.  I read somewhere that Cr with an
> over layer of Au works better than Cr by itself.  I've also heard of
> people using polysilicon as a mask.  You can etch soda-lime glass with
> SF6 plasma, but the etched surface tends to be very rough.
>
> Roger Shile
>
>
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