I was trying to spin coat aluminium with shipley 1818 negative resist.
 But when I used a wet etching solution the resist wasn't able to
withstand the etchant.  My patterns are on the scale of microns and
the best way to etch is through wet etching because i need to remove
alomost 300 micron thick aluminum.  Does anyone know the steps to spin
a thick layer of resist that will withstand the etchant that is made
up of Hcl and CuCl2.  I have SU-8 and 1818 to my disposal.  I also
need to remove the resist after the etching process.

Thank you,

Vivek Mukhatyar