maybe you should try phosphoric acid instead?
shay

Vivek Mukhatyar wrote:

>I was trying to spin coat aluminium with shipley 1818 negative resist.
> But when I used a wet etching solution the resist wasn't able to
>withstand the etchant.  My patterns are on the scale of microns and
>the best way to etch is through wet etching because i need to remove
>alomost 300 micron thick aluminum.  Does anyone know the steps to spin
>a thick layer of resist that will withstand the etchant that is made
>up of Hcl and CuCl2.  I have SU-8 and 1818 to my disposal.  I also
>need to remove the resist after the etching process.
>
>Thank you,
>
>Vivek Mukhatyar
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