Sorry , it is 1500A. not 150A.  We are doing Al evaporation deposition rate
of 100A /s , wonder if we should reduce the rate to improve the film
quality?

thanks
Andrew



----- Original Message -----
From: "Isaac Wing Tak Chan" 
To: "Andrew Xiang" ; "General MEMS discussion"

Sent: Friday, November 26, 2004 4:36 PM
Subject: Re: [mems-talk] optimal Al deposition rate on photoresist


> Andrew,
>
> Higher dep rate usually means more voids in a PVD film. Why would you need
> high dep rate if your target thickness is only 150A?
>
>
> Isaac
>
> On Fri, 26 Nov 2004, Andrew Xiang wrote:
>
>> Is there an optimal aluminum evaporation deposition rate on top of
>> photoresist? Target thickness is 150A.
>> Does faster deposition rate mean better film structure? more resistant to
>> corrosion?
>>
>> thanks
>> Andrew
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>