Peeling of sputtered Ru is always a problem. Try capping it with some other
metal like W. Cleaning method will probably not help.
Niv



----- Original Message -----
From: Philippe Combette 
Date: Friday, November 26, 2004 12:02 pm
Subject: [mems-talk] RuO2 deposition

> Hi all,
> I have some difficulties in RuO2 films deposition by sputtering on
> different substrates like SiO2 and SiNx low stress. When the
> thickness is
> more than 120 nm, the film peel off on SiNx. I tried different
> clean
> methods (RCA, pirahna, with or without HF dip), but finally after
> few days,
> the films peel off. Is anyone got the same difficulties ?
> Thank you.
> Philippe Combette
>
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