durusmail: mems-talk: Advice Needed on Rinsing Problem
Advice Needed on Rinsing Problem
2004-12-21
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Advice Needed on Rinsing Problem
su mems
2004-12-21
Dear SU-8 users,
I am using SU-8 2050, and i rinse for 2 min. Somtimes the
strucutres after development/rinsing suffered from
deformation.
Hence would appreciate if advise/comments on rinsing.
In the first place, what's the mechanism behind rinsing?
Is it that IPA will replaces the extra trapped SU-8
developer? Due to its high volatitlity, wouldn't IPA be
rather destructive due to capillary forces? And wouldnt
ordinary deionized water be better since capillary forces
will be much lower? The website below seems to disagree
and says H2O is simply hopeless. Does anyone know why?
Thanks in advance.




Quote from http://aveclafaux.freeservers.com/SU-8.html

Rinsing: I'd be interested in hearing more on this
subject. We have had no success with IPA or DI water. IPA
seems to create white spots, which can not be subsequently
removed in PGMEA. IPA may also cause surface cracking due
to the high evaporation/cooling rate. DI water seems to be
death. Any ideas?


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