Hi Joe,

I have read a paper in Microelectronic Engineering (2004 - 73-74) about
direct writing of SU-8, what they reported was patternig of 280 nm thick
layer, pattern were cylinders with a diameter of 100 nm. check the paper.

regards

J.


-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]
On Behalf Of laetitia philippe
Sent: Dienstag, 21. Dezember 2004 12:25
To: mems-talk@memsnet.org
Subject: [mems-talk] EBL + SU8


Hello Al,

I wonder if SU8 is a good candidate for ebeam lithography since I know below
350 nm, it behaviour can be difficult. Also, has someone try to see the
resolution obtained with EBL and SU8

Is it possible to make successive exposition-developpement on a thick layer
of SU8, in order to pattern higher aspect rations, if a good resolution
table permits to positionate the sample exactly at the same place?

many thanks
Joe


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