I'm trying to pattern photoresist on the PDMS but got the following
problems. Can you guys kindly help me fix them?

1. I spined PR1818 on the PDMS but found there are a lot of thin cracks in
the photoresist after the softbake. I guess it is caused by the difference
of thermal coefficients between the photoresist and the PDMS. Did you guys
have this problem and how did you resolve it?

2. I want to pattern photoresist on PDMS with a feature size of 3-5um, do
you think it is possible? I plasma-treated the PDMS before coating
photoresist and it seems the adhesion of the resist on the PDMS is very
good, but when the exposed wafers are developed, all the lines with width
less than 10um flaked off the PDMS substrate.

Thanks you very much for you help,

Hongjun Zeng, PhD

Microfabrication Application Laboratory (MAL)
University of Illinois at Chicago
3014 ERF Building, 842 W. Taylor Street
Chicago, IL 60607
Tel. 312-413-5889, Fax: 312-996-6465