> I'm looking for Ti thin film resistiivty and Cr thin
> film resistivity. Resistivity vs. temp. data of these
> thin films will also be appreciated.

Both materials are highly reactive, so resistivity will strongly
depend on base vacuum/leakup rate of the deposition equipment.
And, I mean, REALLY STRONGLY depend!

For our PVD equipment, we spec:
Ti <65 micro-Ohm-cm at 300 C
Cr <35 micro-Ohm-cm at 300 C
actual values are usually ca. 10% lower.

The higher the temperature, the lower the resistivity, under
clean conditions. This is often masked by increased out-gassing
of chamber parts at higher temperature.

best regards,
klaus

--
Klaus Beschorner
Metron Technology, European Applications Manager
Drosselweg 6,71120 Grafenau,Germany. Tel +49-7033-45683