Chris- I strongly suspect what is happening is that the nitride mask on the "bad" channels has broken off during the etch. As the channel etches it severely undercuts the very thin mask, which can break at any time. Once the overhanging mask breaks off a channel- particularly if it happens late in the process- the etch rate increases significantly, resulting in a wider and somewhat deeper channel. And because it could happen at any time, you end up with channels of various widths. A standard nitride mask is under tremendous tensile stress; when the overhanging portion breaks it snaps off the entire channel and curls up at the ends, just like a string breaking on a guitar. The fractured edge of the mask follows the edge of the channel almost perfectly, which is why the channel ends up uniformly wider. I have seen this happen on my wafers. To verify it on your wafers, try agitating more vigorously to "break" even more channels. About the only way I have found to control this problem is to lower the stress of the mask film. It may also help some to round the ends of your mask features so as not to concentrate the stress in sharp corners. I hope this helps you, and good luck. If you want to discuss it further, drop me a line. -- Marc Straub Visteon Automotive Systems, Ford Motor Company Dearborn, MI mstraub1@ford.com ----------------------------------------- On Mar 11, 5:10pm, Chris Turner wrote: > Subject: Isotropic etch problem > Hello, > > We are producing a micro-chemical reactor module that > requires isotropic etching of 100 micron wide channels in > silicon. > > We do this using a standard HF/Nitric/Acetic acid mixture > with a silicon nitride masking layer. This results in several > of the channels etching differently to the rest. The different > channels are slightly wider by about 5-10 microns and have > a much rougher, almost crystalline, surface finish. There are > 120 channels on a wafer and between 1 and 20 per cent can > be different. This effect runs the whole length of the channel, > but neighbouring channels can be unaffected. > > Has anyone seen this sort of thing before and if so is there a > way of preventing it? > > Any help gratefully received. > > Thanks > > Chris Turner > Senior Research Engineer > > ========================= > Central Research Labs > Dawley Road > Hayes > Middlesex > United Kingdom > > Tel. +44 (0)181 848 6465 > Fax. +44 (0)181 848 6442 > e-mail cturner@crl.co.uk > Web. www.crl.co.uk > > >-- End of excerpt from Chris Turner