Maryla,

You may try to use DRIE in stead of KOH to produce the window membrane. I
did this process before.

Good luck
David
----- Original Message -----
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Sent: Monday, January 10, 2005 5:20 AM
Subject: [mems-talk] Si02/Si3N4 membranes


> Hi all
> I was wondering if someone could help me.
> I am trying to etch SiO2/Si3N4 membranes in 100 Si wafer.  The thickness
> of the Si3N4 and thermal oxide layers are  100nm
> and  2.5micron, respectively.
> The Si3N4 layer is removed by the  RIE ,  while  SiO2 in BHF and
> then etched in KOH to produce the window membrane. Unfortunately,  each
> time I repeat my process the membranes brake.
>  Could someone  advise me why this is happening and suggest solution to
> this problem.
> Also, what are  the best conditions for fabrication of the SiO2 membranes?
> Thank you very much in advance.
>
> Maryla
>
>
>