durusmail: mems-talk: Quality of sputtered Si3N4 films
Quality of sputtered Si3N4 films
2005-03-05
What RGA to buy
2005-03-06
Quality of sputtered Si3N4 films
Michael D Martin
2005-02-23
Hi Amol,
    Standard sputtering of SixNy is problematic for use in MEMS
devices. First it has a low sputter yield, so it takes a long time to
deposite a resonable thickness. Second, and probably most important,
these films always have lots of pin holes. So I would not count on these
films for a masking layer.

-Mike Martin

reply