Hi Federica,

I have had some trouble getting AZ5214 to work for me: here's what works for
me:

* soft bake @ 90 deg C for 60 s.
* 1st exposure (using broadband contact aligner) ~3 s. ( I believe total
intensity is on the order of 5 mW/cm^2)
* Reversal bake: 4 mins @ 120 Deg. C Make sure your hotplate actually IS at
that temperature, this took me some time to correct. Lower temps will not
fully convert the exposed resist and in the end will wash everything off of
your substrate.
* Flood exposure 90 s.
* Develop in AZ300MIF or CD-26 for 1 min or until visually done (agitating
the bath I found not to be a good idea)

Good luck, hope this helps.

Jobert van Eisden
SUNY Albany