durusmail: mems-talk: Cleaning Si3N4 / SiO2 Surface
Cleaning Si3N4 / SiO2 Surface
Cleaning Si3N4 / SiO2 Surface
ajheim@mail.usf.edu
2005-03-29
I am worried about changing the thickness of the sample (oxide) after
cleaning. We are removing PDMS and/or biological contaminents.

> August,
>
> Any resist stripper or O2 plasma should do the job.  If O2 plasma takes
> too
> long I wonder what is the organic you are trying to remove.  I also wonder
> why you fear that you will oxidize an oxide

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