Dear members of the MEMS community

I have a problem of adherence of my Ti/Au films on Si and glass substrates.
Both layer are grown by thermal evaporation (Joule effect) in a vaccum better
than 1e-6 mbar. The growth speed is around 0.2 A/s for Ti and 1 A/s for Au. The
thickness of my gold layer is 50 nm and between 5 and 10 nm for Ti.
Does anyone can indicate me what can be wrong with my parameters?? Or if anyone
has some parameters to recommend...

Thanks a lot!!!

Natacha