Natacha,

I don't know about the Ti, but I thermally evaporate my Au at 5A/sec and e-beam
evaporate it at 25A/sec.  Is there a reason you evaporate so slow?

Brent

natacha smetana wrote:

> I have a problem of adherence of my Ti/Au films on Si and glass substrates.
> Both layer are grown by thermal evaporation (Joule effect) in a vaccum better
than 1e-6 mbar. The growth speed is around 0.2 A/s for Ti and 1 A/s for Au. The
thickness of my gold layer is 50 nm and between 5 and 10 nm for Ti.
> Does anyone can indicate me what can be wrong with my parameters?? Or if
anyone has some parameters to recommend...