Parameters are fine. I've done many Ti on Si with similar parameters (1.2A/s)
via sputtering. The cleaning of the Si substrate could be a problem. A quick
oxide etching just prior to deposition helps.
A.

Brent Garber  wrote:

I don't know about the Ti, but I thermally evaporate my Au at 5A/sec and e-beam
evaporate it at 25A/sec. Is there a reason you evaporate so slow?