>I am using cured polyimide (PI 2545) as a sacrificial layer in a process >to >create long and wide airbridges. I have been using hot (110C) >Ethylenediamine >to etch the polyimide, but it does not seem to remove all of the >material >underneath the bridges. I have included holes to facilitate the >diffusion of the >etchant under the bridges as well as a stirrer, but to no avail. Does >anyone >know of other etchants that could be used to remove the polyimide; >especially >underneath the bridges? By the way, the bridges are made of chrome and >electroplated gold. Therefore, the etchants cannot attack these metals. > >Thanks, > > Sergio > >-- > >*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-* > ._, > ,_| |._/\ Sergio Palma Pacheco > | |o/^^~-._ Radiation Laboratory > /-' | ~ 3121 EECS Building > \__/|_ /' University of Michigan > \__ | . Ann Arbor, MI 48109 > | __/' > > /' Tel: (313) 936-2975 > /' /' Fax: (313) 747-2106 > ~~^\/' e-mail: pacheco@engin.umich.edu > >*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-*-* > > > ****************************************************** Dipl.-Ing. Ralf Keller Fraunhofer-Institut fuer Biomedizinische Technik IBMT Abteilung Sensorsysteme / Mikrosysteme Ensheimer Str. 48 66386 St. Ingbert Germany Tel.: +49 (0) 6894 / 980-158 Fax: +49 (0) 6894 / 980-400 e-mail: ralfk@ibmt.fhg.de http://www.ibmt.fhg.de