Use SF6 plasma. Pavel

On Tue, 3 Mar 1998 m.zai@ic.ac.uk wrote:

> Dear MEMS experts,
>
> Can the RIE etch rate of polyimide be made slower than the one of
> B-doped silicon ?
>
> Any information on changing selectivity of materials by RIE is welcome.
>
>
> Thank you.
>
> Marvin
>
>
>