Antti,

You may want to look into the AZ n6000 series resists (more
specifically, the n6070 grade).  This material is capable of coating up
to 15 um in a single process on pretty much any coater - some coaters
can manage up to ~30um in a single coat (the EVG150 can actually manage
65um in a single coat).

This material is negative tone, but uses Propylene Glycol Monomethyl
Ether Acetate (PGMEA) as the base solvent, which is considered to be a
"safe" solvent, and is used in most of AZ's lines of resist, plus in the
Shipley (now Rohm & Haas) S1800 line.

The developer for this material is AZ 300MIF, which is a .26N TMAH
developer.  I am unsure of the stripper, but I'd imagine that AZ would
make a stripper to remove this material.

Best Regards,
Chad Brubaker

 -----Original Message-----
From: anttipe@cc.hut.fi
Subject: [mems-talk] About Negative Photoresist

I'm looking for negative photo resist for 5 to 30 um processing. In this
process the resolution is not important. The resist and developer should
(if possible) be nontoxic. It would nice to have resist stripped in Ace or
in some AZ developer. I know Japanese have resist called NFR015, but they
doesn't seem to sell it to Europeans. I wonder what you might know about
PR's or PR vendors?