Dear Yu Chen,


Hello, there are several ways to dope, ion implant, boron solution or
spin-on boron, planar source, Boron gas in the diffusion tube etc.

It seems the easiest is for you to use a boron solution that can be spun
on, brushed on or dip coated. These types of solutions can be obtained from ;
Filmtronics
Butler, Pa.

Tel 724 352 3790
Fax 724 352 1772

They have several solutions that can work fine, let them know the
approximate concentration of dopant needed and the temperature you wish to
diffuse at or use RTP.

Hope this helps, if you have any questions please ask.
Sincerely, Neal



At 01:45 PM 6/24/2005 -0400, you wrote:
>I want to build a simple setup of boron doping system.
>It is going to be used to dope small silicon wafer(2mm*2mm), 1 micron doping
>depth is enough.
>is there any reference I can consult to do this job?
>any suggestion is welcome
>
>best
>
>Yu Chen

Neal Christensen
675 Saxonburg Rd.
Box 1571
Butler, PA 16003-1571 USA

T-724-352-4433
F-724-352-7680

neal@zbzoom.net

work tel 724 - 352+3710
work fax 724-352+1772

nchristensen@filmtronics.com