Hi Hongjun,

 The tolerance of the angle is very strict. It's about 1 degree. I know the
angle of KOH etch is about 54 degree. So that's not appliable in this case.
Thanks.
Ning
----- Original Message -----
From: "Hongjun-ECE" 
To: "'General MEMS discussion'" 
Sent: Monday, August 01, 2005 12:37 PM
Subject: RE: [mems-talk] How to etch Silicon into oblique walls using ICP?


> How much is the tolerance of the angle? If the angle requirement is not
> strict, the simplest way is KOH etch. The etch rate can be 1-2um per
minute.
>