durusmail: mems-talk: Photoresist for Lift-off process
Photoresist for Lift-off process
2005-08-02
2005-08-03
2005-08-05
2005-08-08
KOH Wet Etching of Si wafers
2005-08-09
2005-08-10
2005-08-12
2005-08-09
2005-08-11
Photoresist for Lift-off process
Bill Moffat
2005-08-03
Richard,
        Think any positive resist a YES image reversal unit and the
ability to manufacture below 0.1 micron.


Bill Moffat, CEO
Yield Engineering Systems, Inc.
2185 Oakland Rd., San Jose, CA  95131
(408) 954-8353

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