Chad and others,

I will be trying using image reversal lithograpy using AZ5214E and
AZ326-MIF developer for liftoff of aluminum, chromium/gold, and niobium
patterns. (I have found that AZ351B developer, being very alkaline,
etched my aluminum patterns severely.) If you know of a recipe for this
process, I'd appreciate it. I'm hoping that my films, all ~100-nm thick,
on 1.4-micron thick resist, will liftoff more easily and without
sonication with the negative sidewall profiles. (Sometimes my films
detached with standard positive sidewall profiles I suspect.) Thanks.

Thomas Wilson
Marshall University/Physics