I saw your post on MEMS talk. I am using a YES oven to do image reversal
and S1818 photoresist. My question is what is the best way to determine
the exposure time for image reversal? Also, what is the quickest way to
determine the exposure time for image reversal.

Thank-you,
Boyd Evans

-----Original Message-----
From: Bill Moffat [mailto:BMoffat@yieldengineering.com]
Sent: Wednesday, August 03, 2005 11:50 AM
To: General MEMS discussion
Subject: RE: [mems-talk] Photoresist for Lift-off process

Richard,
        Think any positive resist a YES image reversal unit and the
ability to manufacture below 0.1 micron.