In my experience, MIF 319 etched aluminum very fast.  I used to use MIF 319
to remove LOR-5B after lifting off Al with Acetone (using bilayer).  It
etched the Al very rapidly.

-Bill

-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]
On Behalf Of Steven McMaster
Sent: Tuesday, August 23, 2005 9:23 AM
To: 'General MEMS discussion'
Subject: RE: [mems-talk] Problems with lift-off using S1813 photoresist

You can use MIF 319 to develop out the S1813 and LORXXB. So I recommend
still using the bi layer method.

Steven McMaster
Engineer