If you want to etch thin layer of parylene (1-2 um),
photoresist can be used as the mask.

I use Cr/Au (2000A)as the hard mask to pattern 6-8 um
parylene in oxygen plasma (100 W, 45 sccm, 250 Torr).

Likun

--- Johannes Grether 
wrote:

> Hi all together,
>
> I have got a question concerning etching of
> parylene. As far as I know, the way
> to etch parylene is an oxygen plasma etching
> process. As the ratio to a resist
> is about 1:1, I want to use a chromium mask to
> pattern the parylene during the
> etching.
> My question is: has anybody any expertise in this
> etching process and can give
> me some data that I can use as a guideline?
>