If you want it thick, I would sputter it under conditions of power and pressure
for low stress. See papers by Thornton and Hoffman for details. Evaporation does
not give you the control of incoming atom energy required for stress control.
I haven't done thick Cr, but have sputtered low-stress W over 2 um thick,
and you should be able to achieve similar for Cr. See my Ph.D. dissertation
online at www-bsac.berkeley.edu for details.
   --Kirt Williams

Silvan Schmid  wrote:
Dear All,

I would like to use chrome as sacrificial layer.
Does anybody know the maximal achievable thickness of a chrome layer
when sputtered/evaporated on a glass substrate?
Thankx!