Hi Silvan,

for this purpose I usually use old, expired AZ-positive resist, e.g. AZ 4533
and I remove it with AZ 400k developer UNDILUTED.
AZ 400k developer normally has to be diluted 4:1 , but undiluted
it will strip even unexposed AZ resists.
This developer ist nothing else than diluted KOH, so it will not attack
SU-8.

Another possible way is to flood expose the AZ-resist and to remove it
with normal developer.

regards
Peter

Silvan Schmid wrote:

> Dear all,
>
> I have SU-8 structures which I need to cover with a photoresist layer
> in order to protect them during the dicing process. The solvent to
> remove the protection layer should not alter the SU-8 (e.g. SU-8 will
> swell in acetone).
> Do you have any experience, which photoresist/developer pair is best
> suited for this task?