I don't know about your process compatibility, but an iodine based wet etch
(for example Transene TFA, which is KI +I2) is compatible with standard
lithography.  It leaves the exposed gold a little mucked up, which could be
cleaned up with an Argon plasma.

David Nemeth
Senior Engineer
Sophia Wireless, Inc.
14225-C Sullyfield Circle
Chantilly, VA 20151
-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org]On Behalf Of Richard Chang
Sent: Tuesday, December 06, 2005 7:07 PM
To: General MEMS discussion
Subject: [mems-talk] Argon plasma for gold etching


Hi, All,

   I want to use argon plasma to etch away exposed gold.
   My thickness of gold is 1 micron.
   Does anybody have the recipe for the plasma etching, like RF power,
pressure of Argon?
   How long it might take to etch away 1 micron thick gold?
   Thank you.

Best Regards,

Richard


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