Exposure requires a fairly complicated model. Factors such as develop
process, exposure tool field size (exposure is joules/area), soft, bake, PEB
temp, etc would make for a very complicated equation. Also the exposure
varies sinusoidaly (due to refracted light) over thickness depending on what
type of substrate you are exposing.

Robert

-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]
On Behalf Of Isaac Chan
Sent: Thursday, January 12, 2006 10:41 AM
To: General MEMS discussion
Subject: Re: [mems-talk] Photoresist Exposure Dose

You mean resist contrast curve? Should you be able to get it from the
manufacturer's data sheet? They usually give you dose-to-clear value for
reference.

Best regards,

Isaac Chan, Ph.D.

Sr. Process Engineer
Work: 519.888.4567 x6014
"Innovate. Lead. Succeed."

On Tue, 10 Jan 2006, haixinzhu wrote:

> Hello,
>
> I am wondering where I can find the info regarding the requsted exposure
> dose for 1um thick OCG 825 (10um line width) and 10um AZP4620(10um line
> width). I believe the dose is related to the thickness and line width
> through some function or equation, but just could not find it out. Anyone
> can give me a hand?