I was interested if anyone had a particular resist they used for a lift off
process of Cr/Au pads on glass slides or on PDMS.

Process that I would like to perform:

1) Clean substrate
2) Dry, perhaps HMDS
3) Spin PR (What PR is good?)
4) Develop
5) Evaporate Cr/Au on substrate
6) Lift off the PR to expose just substrate and Cr/Au

Has anyone tried this or have suggestions?

I don't know what PR is good for glass slides or PDMS

 - thanks - Gabe Dagani

  UT Austin, NNIN MRC