Hi Gabe,

I use Microposit S1813 for a lift off process of Cr/Au electrodes on
glass substrate. You need to soak the resist in chlorobenzene for appr.
4 min after exposure. Chlorobenzene diffuses into the top layer of the
S1813, forming a gel. This gel layer develops much more slowly than the
rest, causing an undercut.

1) Clean substrate (oxygen-plasma)
2) Dry, HMDS
3) Spin Microposit S1813 (4000rpm for 30 sec)
4) Expose (150 mJ)
5) Soak in chlorobenzene for 4 min, blow dry in nitrogen
6) Develop (20% Microposit 351 Developer for 24 sec)
7) Evaporate Cr/Au
8) Lift off in Aceton

It is an easy process, always works well for me. If you have any
questions, don't hesitate to contact me.

Good luck!
cheers!
Silvan

Gabe Dagani wrote:
> I was interested if anyone had a particular resist they used for a lift off
> process of Cr/Au pads on glass slides or on PDMS.
>
> Process that I would like to perform:
>
> 1) Clean substrate
> 2) Dry, perhaps HMDS
> 3) Spin PR (What PR is good?)
> 4) Develop
> 5) Evaporate Cr/Au on substrate
> 6) Lift off the PR to expose just substrate and Cr/Au
>
> Has anyone tried this or have suggestions?
>
> I don't know what PR is good for glass slides or PDMS
>