HI Fellows,

I am using AZ50, a positive PR. After exposing the PR under UV of 6min
for thickness about 30um, the surface is like burnt, with some pattern
on top, the surface is like burnt. Moreover, towards the end of
developing, it is obvious to see gas bubble on the wafer surface, which
severely damages the pattern. Can anyone share the way to remove these
problems? Thanks.

Happy Lunar Dog Year,
Zeta Tak For Yu