I have etched SU8 (crosslinked) using RIE  O2 flow = 99sccm and SF6 flow = 5sccm
with 500w you get around 0.75um/min. You need the SF6 to help etch the Silane
groups that are in the SU8, otherwise you get a surface full of black dots and
it is very rough.

Rick

Rick Morrison
Senior Member of the Technical Staff
The Charles Stark Draper Laboratory


-----Original Message-----
From: Richard Chang
Sent: Monday, April 03, 2006 1:14 PM
To: General MEMS discussion
Subject: [mems-talk] Pattern cross-linked SU-8

Hi, All,

  Does anybody know if RIE can pattern cross-linked SU-8?
  I look at microchem's website and RIE can be used to remove SU-8.
  The problem is the high power is needed. Also, it's for removal, not
patterning.

  Our RIE system can provide up to 500 W and the max O2 flow rate is 10 sccm.
  Does anybody can provide the recipe?